High-field Injection Modification of Nano-thickness Dielectric Films in the MOS Devices
Published: 15.10.2013
Authors: Andreev V.V., Stolyarov A.A., Akhmelkin D.M., Romanov A.V.
Published in issue: #6(18)/2013
DOI: 10.18698/2308-6033-2013-6-802
Category: Nanoengineering